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    Please use this identifier to cite or link to this item: http://asiair.asia.edu.tw/ir/handle/310904400/9576


    Title: High-Sensitivity Planar Si-Based MSM Photodetector with Very Thin Amorphous Silicon-Alloy Quantum-Well-Like Barrier Layers
    Authors: Cha-Shin Lin;Li-Ping Tu;Rong-Hwei Yeh;Jyh-Wong Hong
    Keywords: Amorphous layer;heterointerface;photodetector (PD)
    Date: 2003-07
    Issue Date: 2010-05-12 01:12:29 (UTC+0)
    Publisher: Asia University
    Abstract: A high-sensitivity, low dark-current planar Si-based metal-semiconductor-metal photodetector (PD) has been successfully fabricated. Under a very weak 0.83-μm incident light power (0.5 μW) and a 4-V bias voltage, the device photocurrent-to-dark-current ratio (Ip/Id) could reach 103. Also, the average full-width at half-maximum and fall time of the device temporal response were 68.18 and 294.7 ps, respectively, as measured with a periodic 0.83-μm 60-ps light pulse at a 10-V bias voltage. In contrast to the previously reported various Si-based PDs, this device exhibited significant improvements in sensitivity and temporal response due to the employed quantum-well-like amorphous silicon-alloy barrier layers.
    Relation: IEEE Photonics Technology Letters 15(7):966-968
    Appears in Collections:[光電與通訊學系] 期刊論文

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