Simulation of P-type Doping Profile Prediction Using Different Ion Implantation and Diffusion Model

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Title:	Simulation of P-type Doping Profile Prediction Using Different Ion Implantation and Diffusion Model
Authors:	Ma；Subramanyaj；Subramanyaj, Vivek Ningar；Vivek Ningaraju；Antonius Fra；Antonius Fran Yannu Pramudyo；許健；Gene Sheu；Erry Dwi Kur；Erry Dwi Kurniawan；楊紹明；Shao-Ming Yang ；Jia-Wei Ma；Jia-Wei
Contributors:	資訊工程學系
Date:	2015-04
Issue Date:	2015-11-12 06:42:33 (UTC+0)
Relation:	Applied Mechanics and Materials
Appears in Collections:	[資訊工程學系] 期刊論文

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