ASIA unversity:Item 310904400/80681
English  |  正體中文  |  简体中文  |  全文笔数/总笔数 : 94286/110023 (86%)
造访人次 : 21654409      在线人数 : 769
RC Version 6.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜寻范围 查询小技巧:
  • 您可在西文检索词汇前后加上"双引号",以获取较精准的检索结果
  • 若欲以作者姓名搜寻,建议至进阶搜寻限定作者字段,可获得较完整数据
  • 进阶搜寻


    jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://asiair.asia.edu.tw/ir/handle/310904400/80681


    题名: Microstructure and Optoelectronic Properties of P-type CuCrO2 Thin Films Prepared by Sol-Gel Synthesis
    作者: Hu, De-He
    贡献者: 光電與通訊學系
    关键词: CuCrO2
    TCOs
    Sol-gelmethod
    Spin coating
    日期: 2014-07-31
    上传时间: 2014-09-03 01:10:54 (UTC+0)
    出版者: Asia University
    摘要: In this study, the structural, optical and electrical properties of CuCrO2 films were examined. The research showed that CuO、Cr2O3 and CuCr2O4 were intermediate phases for the formation of CuCrO2. Pure CuCrO2 was formed at temperature of 550℃ for 120 minutes. The average grain sizes were nanometer-scale. The annealing processes were favorable for CuCrO2 formation with a circle- and polygonal-like mixed microstructure. The crystal structure, microstructure, and defects are factors contributing to the electrical properties of CuCrO2. Reduction of point defects in the film, which contributed to decrease in the photon scattering and carrier concentration. Direct band gap of the films were respectively 2.81、2.82、2.86、3.0 and 3.03 eV. The film possesses a relatively low resistivity of 2.17×102 Ωcm due to a relatively high carrier concentration of 6.24×1015 cm3 and mobility of 4.79 cm2/Vs.
    显示于类别:[光電與通訊學系] 博碩士論文

    文件中的档案:

    档案 描述 大小格式浏览次数
    index.html0KbHTML389检视/开启


    在ASIAIR中所有的数据项都受到原著作权保护.


    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 回馈