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    ASIA unversity > 資訊學院 > 光電與通訊學系 > 會議論文 >  Item 310904400/15025


    Please use this identifier to cite or link to this item: http://asiair.asia.edu.tw/ir/handle/310904400/15025


    Title: Alternative Methods Under Hydrogen Dilution to Fabricate Nanocrystalline Silicon Films by Plasma-Enhanced Chemical Vapor Deposition
    Authors: 葉榮輝;Yeh, Rong-Hwei
    Contributors: 光電與通訊學系
    Date: 2009-12
    Issue Date: 2012-11-23 03:14:46 (UTC+0)
    Relation: OPT 2009 台灣光電科技研討會暨國科會光電學門研究成果發表會
    Appears in Collections:[光電與通訊學系] 會議論文

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